Yoshinao Harada
According to our database1,
Yoshinao Harada
authored at least 2 papers
in 2001.
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Bibliography
2001
Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics.
Microelectron. Reliab., 2001
Effects of base layer thickness on reliability of CVD Si<sub>3</sub>N<sub>4</sub> stack gate dielectrics.
Microelectron. Reliab., 2001