Yongchan James Ban

According to our database, Yongchan James Ban authored at least 2 papers between 2021 and 2024.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2024

Optimizing and Addressing Stitch Challenges in High-NA EUV Lithography for Large Die Designs.

Yongchan James Ban, Gangsic Kim, Hosoon Shin

Proceedings of the 21st International SoC Design Conference, 2024

2021

Mitigating IR-Drop with Design Technology Co-Optimization for Sub-Nanometer Node Technology.

Dohyeon Lee, Heecheol Hwang, Hyunteck Oh, Yongchan James Ban

Proceedings of the 18th International SoC Design Conference, 2021