Yongchan Ban
According to our database1,
Yongchan Ban
authored at least 11 papers
between 2008 and 2015.
Collaborative distances:
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Bibliography
2015
Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line.
Proceedings of the 25th edition on Great Lakes Symposium on VLSI, GLVLSI 2015, Pittsburgh, PA, USA, May 20, 2015
2012
Proceedings of the 2012 IEEE/ACM International Conference on Computer-Aided Design, 2012
2011
Modeling of Layout Aware Line-Edge Roughness and Poly Optimization for Leakage Minimization.
IEEE J. Emerg. Sel. Topics Circuits Syst., 2011
Doppler: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing.
Proceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design, 2011
Layout aware line-edge roughness modeling and poly optimization for leakage minimization.
Proceedings of the 48th Design Automation Conference, 2011
Flexible 2D layout decomposition framework for spacer-type double pattering lithography.
Proceedings of the 48th Design Automation Conference, 2011
2010
Proceedings of the 2010 International Symposium on Physical Design, 2010
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography.
Proceedings of the 47th Design Automation Conference, 2010
2009
ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2009
2008
Proceedings of the 2008 International Conference on Computer-Aided Design, 2008
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction.
Proceedings of the 45th Design Automation Conference, 2008