Yong-Gee Ng
According to our database1,
Yong-Gee Ng
authored at least 14 papers
between 1999 and 2016.
Collaborative distances:
Collaborative distances:
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Bibliography
2016
A 0.6 V, 1.5 GHz 84 Mb SRAM in 14 nm FinFET CMOS Technology With Capacitive Charge-Sharing Write Assist Circuitry.
IEEE J. Solid State Circuits, 2016
2015
Proceedings of the 2015 IEEE International Solid-State Circuits Conference, 2015
2013
A 4.6 GHz 162 Mb SRAM Design in 22 nm Tri-Gate CMOS Technology With Integrated Read and Write Assist Circuitry.
IEEE J. Solid State Circuits, 2013
2012
A 4.6GHz 162Mb SRAM design in 22nm tri-gate CMOS technology with integrated active VMIN-enhancing assist circuitry.
Proceedings of the 2012 IEEE International Solid-State Circuits Conference, 2012
2011
A 32 nm High-k Metal Gate SRAM With Adaptive Dynamic Stability Enhancement for Low-Voltage Operation.
IEEE J. Solid State Circuits, 2011
IEEE Des. Test Comput., 2011
2010
A 4.0 GHz 291 Mb Voltage-Scalable SRAM Design in a 32 nm High-k + Metal-Gate CMOS Technology With Integrated Power Management.
IEEE J. Solid State Circuits, 2010
A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation.
Proceedings of the IEEE International Solid-State Circuits Conference, 2010
2009
A 3.8 GHz 153 Mb SRAM Design With Dynamic Stability Enhancement and Leakage Reduction in 45 nm High-k Metal Gate CMOS Technology.
IEEE J. Solid State Circuits, 2009
A 4.0 GHz 291Mb voltage-scalable SRAM design in 32nm high-κ metal-gate CMOS with integrated power management.
Proceedings of the IEEE International Solid-State Circuits Conference, 2009
2008
A 1.1 GHz 12 µA/Mb-Leakage SRAM Design in 65 nm Ultra-Low-Power CMOS Technology With Integrated Leakage Reduction for Mobile Applications.
IEEE J. Solid State Circuits, 2008
A 153Mb-SRAM Design with Dynamic Stability Enhancement and Leakage Reduction in 45nm High-Κ Metal-Gate CMOS Technology.
Proceedings of the 2008 IEEE International Solid-State Circuits Conference, 2008
2007
A 1.1GHz 12μA/Mb-Leakage SRAM Design in 65nm Ultra-Low-Power CMOS with Integrated Leakage Reduction for Mobile Applications.
Proceedings of the 2007 IEEE International Solid-State Circuits Conference, 2007
1999
IEEE J. Solid State Circuits, 1999