Wenze Yao
Orcid: 0000-0003-0681-0971Timeline
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Bibliography
2023
Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography.
Microelectron. J., March, 2023
Efficient Proximity Effect Correction Using Fast Multipole Method With Unequally Spaced Grid for Electron Beam Lithography.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2023