Takamasa Kawanago

According to our database1, Takamasa Kawanago authored at least 8 papers between 2010 and 2018.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

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Links

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Bibliography

2018
Gated Four-Probe Method to Evaluate the Impact of SAM Gate Dielectric on Mobility in MoS2 FET.
Proceedings of the 48th European Solid-State Device Research Conference, 2018

2017
Radical oxidation process for hybrid SAM/HfOx gate dielectrics in MoS2 FETs.
Proceedings of the 47th European Solid-State Device Research Conference, 2017

2016
La<sub>2</sub>O<sub>3</sub> gate dielectrics for AlGaN/GaN HEMT.
Microelectron. Reliab., 2016

Adhesion lithography to fabricate MoS2 FETs with self-assembled monolayer-based gate dielectrics.
Proceedings of the 46th European Solid-State Device Research Conference, 2016

2013
Advantage of TiN Schottky gate over conventional Ni for improved electrical characteristics in AlGaN/GaN HEMT.
Proceedings of the European Solid-State Device Research Conference, 2013

2012
Analysis and modeling of the gate leakage current in advanced nMOSFET devices with severe gate-to-drain dielectric breakdown.
Microelectron. Reliab., 2012

(100)- and (110)-oriented nMOSFETs with highly scaled EOT in La-silicate/Si interface for multi-gate architecture.
Proceedings of the 2012 European Solid-State Device Research Conference, 2012

2010
SrO capping effect for La<sub>2</sub>O<sub>3</sub>/Ce-silicate gate dielectrics.
Microelectron. Reliab., 2010


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