Roderick R. Kunz

According to our database, Roderick R. Kunz authored at least 4 papers between 1997 and 2001.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of six.

2001

Review of technology for 157-nm lithography.

A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes

IBM J. Res. Dev., 2001

1997

Thin-film imaging: Past, present, prognosis.

David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty

IBM J. Res. Dev., 1997

Lithography at a wavelength of 193 nm.

Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek

IBM J. Res. Dev., 1997

Photoresists for 193-nm lithography.

Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz

IBM J. Res. Dev., 1997