Min-Ching Chu

According to our database, Min-Ching Chu authored at least 2 papers in 2010.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of five.

2010

Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer.

Jagan Singh Meena, Min-Ching Chu, Jitendra N. Tiwari, Hsin-Chiang You, Chung-Hsin Wu, Fu-Hsiang Ko

Microelectron. Reliab., 2010

Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO₂ film as gate dielectric with improved reliability.

Min-Ching Chu, Jagan Singh Meena, Chih-Chia Cheng, Hsin-Chiang You, Feng-Chih Chang, Fu-Hsiang Ko

Microelectron. Reliab., 2010