Michael A. Shinosky

Affiliations:
  • IBM Systems and Technology Group, Essex Junction, VT, USA


According to our database1, Michael A. Shinosky authored at least 5 papers between 2008 and 2015.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

Legend:

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PhD thesis 
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Links

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Bibliography

2015
Breakdown data generation and in-die deconvolution methodology to address BEOL and MOL dielectric breakdown challenges.
Microelectron. Reliab., 2015

Diagnostic electromigration reliability evaluation with a local sensing structure.
Proceedings of the IEEE International Reliability Physics Symposium, 2015

A method for rapid screening of various low-k TDDB models.
Proceedings of the IEEE International Reliability Physics Symposium, 2015

2014
Electron fluence driven, Cu catalyzed, interface breakdown mechanism for BEOL low-k time dependent dielectric breakdown.
Microelectron. Reliab., 2014

2008
Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies.
Microelectron. Reliab., 2008


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