M. X. Li

According to our database, M. X. Li authored at least 2 papers in 2016.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of five.

2016

Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment.

X. Y. Wang, H. Zhang, X. P. Ma, Q. Cheng, C. G. Li, M. X. Li, T. N. Chen, P. Zhang, J. Q. Shao

Microelectron. Reliab., 2016

Improvement of reliability for high-ohmic Cr-Si thin film resistors in a heat and humid environment: Removing moisture source by electrocatalytic decomposition of water.

X. Y. Wang, Q. Cheng, X. P. Ma, H. Zhang, M. X. Li, T. N. Chen, P. Zhang, J. Q. Shao

Microelectron. Reliab., 2016