Lars Liebmann

According to our database, Lars Liebmann authored at least 18 papers between 2001 and 2018.

Collaborative distances:

• Dijkstra number of four.
• Erdős number of four.

2018

A Retrospective View on the Technology Evolution to Support Low Power Mobile Application.

Bipul C. Paul, Ajey P. Jacob, William Taylor, Randy W. Mann, Joseph Versaggi, Edward J. Nowak, Lars W. Liebmann

J. Low Power Electron., 2018

2015

Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line.

Wei Ye, Bei Yu, David Z. Pan, Yongchan Ban, Lars Liebmann

Proceedings of the 25th edition on Great Lakes Symposium on VLSI, GLVLSI 2015, Pittsburgh, PA, USA, May 20, 2015

Pushing multiple patterning in sub-10nm: are we ready?

David Z. Pan, Lars Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin

Proceedings of the 52nd Annual Design Automation Conference, 2015

2014

Sub-20 nm design technology co-optimization for standard cell logic.

Kaushik Vaidyanathan, Lars Liebmann, Andrzej J. Strojwas, Larry T. Pileggi

Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2014

Design and technology co-optimization near single-digit nodes.

Lars W. Liebmann, Rasit Onur Topaloglu

Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2014

2013

Layout Decomposition and Legalization for Double-Patterning Technology.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2013

A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial].

Lars Liebmann, J. Andres Torres

IEEE Des. Test, 2013

2012

O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta

Proceedings of the IEEE International Conference on IC Design & Technology, 2012

2011

Coupling timing objectives with optical proximity correction for improved timing yield.

Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky

Proceedings of the 12th International Symposium on Quality Electronic Design, 2011

A framework for double patterning-enabled design.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta

Proceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design, 2011

2010

Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings.

Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2010

2008

Electrically driven optical proximity correction based on linear programming.

Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky

Proceedings of the 2008 International Conference on Computer-Aided Design, 2008

2007

Rules vs tools: what's the right way to address IC manufacturing complexity?

Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White

Proceedings of the 2007 International Symposium on Physical Design, 2007

2003

Layout impact of resolution enhancement techniques: impediment or opportunity?

Lars Liebmann

Proceedings of the 2003 International Symposium on Physical Design, 2003

2002

CAD computation for manufacturability: can we save VLSI technology from itself?

Mark A. Lavin, Lars Liebmann

Proceedings of the 2002 IEEE/ACM International Conference on Computer-aided Design, 2002

2001

TCAD development for lithography resolution enhancement.

Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham

IBM J. Res. Dev., 2001

Application of automated design migration to alternating phase shift mask design.

Fook-Luen Heng, Lars Liebmann, Jennifer Lund

Proceedings of the 2001 International Symposium on Physical Design, 2001

Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking.

Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur

Proceedings of the 38th Design Automation Conference, 2001