L. J. Tang

According to our database, L. J. Tang authored at least 3 papers between 2003 and 2005.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of five.

2005

Structure of the oxide damage under progressive breakdown.

Felix Palumbo, G. Condorelli, Salvatore Lombardo, Kin Leong Pey, C. H. Tung, L. J. Tang

Microelectron. Reliab., 2005

2004

Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization.

C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee

Microelectron. J., 2004

2003

Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM.

Kin Leong Pey, C. H. Tung, M. K. Radhakrishnan, L. J. Tang, Y. Sun, X. D. Wang, W. H. Lin

Microelectron. Reliab., 2003