Koji Eriguchi

According to our database, Koji Eriguchi authored at least 11 papers between 2001 and 2021.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2021

Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS).

Tomohiro Kuyama, Keiichiro Urabe, Koji Eriguchi

Proceedings of the IEEE International Reliability Physics Symposium, 2021

2015

Impacts of plasma process-induced damage on MOSFET parameter variability and reliability.

Koji Eriguchi, Kouichi Ono

Microelectron. Reliab., 2015

A new prediction method for ReRAM data retention statistics based on 3D filament structures.

Zhiqiang Wei, Koji Katayama, Shunsaku Muraoka, Ryutaro Yasuhara, Takumi Mikawa, Koji Eriguchi

Proceedings of the IEEE International Reliability Physics Symposium, 2015

Surface orientation dependence of ion bombardment damage during plasma processing.

Yukimasa Okada, Koji Eriguchi, Kouichi Ono

Proceedings of the 2015 International Conference on IC Design & Technology, 2015

Plasma-induced photon irradiation damage on low-k dielectrics enhanced by Cu-line layout.

Taro Ikeda, Akira Tanihara, Nobuhiko Yamamoto, Shigeru Kasai, Koji Eriguchi, Kouichi Ono

Proceedings of the 2015 International Conference on IC Design & Technology, 2015

2014

Random telegraph noise as a new measure of plasma-induced charging damage in MOSFETs.

Masayuki Kamei, Yoshinori Takao, Koji Eriguchi, Kouichi Ono

Proceedings of the 2014 IEEE International Conference on IC Design & Technology, 2014

A new aspect of plasma-induced physical damage in three-dimensional scaled structures - Sidewall damage by stochastic straggling and sputtering.

Koji Eriguchi, Yoshinori Takao, Kouichi Ono

Proceedings of the 2014 IEEE International Conference on IC Design & Technology, 2014

2013

Atomistic simulations of plasma process-induced Si substrate damage - Effects of substrate bias-power frequency.

Asahiko Matsuda, Yoshinori Nakakubo, Yoshinori Takao, Koji Eriguchi, Kouichi Ono

Proceedings of 2013 International Conference on IC Design & Technology, 2013

2012

Optimization problems for plasma-induced damage - A concept for plasma-induced damage design.

Koji Eriguchi, Yoshinori Nakakubo, Asahiko Matsuda, Masayuki Kamei, Yoshinori Takao, Kouichi Ono

Proceedings of the IEEE International Conference on IC Design & Technology, 2012

2001

Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics.

Takayuki Yamada, Masaru Moriwaki, Yoshinao Harada, Shinji Fujii, Koji Eriguchi

Microelectron. Reliab., 2001

Effects of base layer thickness on reliability of CVD Si₃N₄ stack gate dielectrics.

Koji Eriguchi, Yoshinao Harada, Masaaki Niwa

Microelectron. Reliab., 2001