John S. Suehle

According to our database, John S. Suehle authored at least 3 papers between 2002 and 2005.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2005

Detailed study and projection of hard breakdown evolution in ultra-thin gate oxides.

John S. Suehle, Baozhong Zhu, Yuan Chen, Joseph B. Bernstein

Microelectron. Reliab., 2005

Reverse short channel effects in high-k gated nMOSFETs.

Jin-Ping Han, Sang-Mo Koo, Eric M. Vogel, Evgeni P. Gusev, C. D'Emic, Curt A. Richter, John S. Suehle

Microelectron. Reliab., 2005

2002

Ultra-thin Gate Oxide Reliability and Implications for Design (Tutorial Abstract).

John S. Suehle

Proceedings of the 3rd International Symposium on Quality of Electronic Design, 2002