Jeffrey Lam

According to our database, Jeffrey Lam authored at least 10 papers between 2015 and 2018.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2018

Solving 28 nm I/O circuit reliability issue due to IC design weakness.

Yi Chao Low, Pik Kee Tan, Soon Leng Tan, Yuzhe Zhao, Jeffrey Lam

Microelectron. Reliab., 2018

2017

Static fault localization of subtle metallization defects using near infrared photon emission microscopy.

Alfred C. T. Quah, Dayanand Nagalingam, Seung Je Moon, Edy Susanto, Ghim Boon Ang, Soh Ping Neo, Jeffrey Lam, Zhihong Mai

Microelectron. Reliab., 2017

Failure analysis methodology on donut pattern failure due to photovoltaic electrochemical effect.

Soh Ping Neo, Alfred C. T. Quah, Ghim Boon Ang, Dayanand Nagalingam, Hnin Hnin Ma, Siong Luong Ting, C. W. Soo, Changqing Chen, Zhihong Mai, Jeffrey Lam

Microelectron. Reliab., 2017

In-depth circuits edit analysis to reveal the implantation-related defect.

Changqing Chen, Ghim Boon Ang, Jeffrey Lam, Zhihong Mai

Microelectron. J., 2017

Concurrent built-in self-testing under the constraint of shared test resources and its test time reduction.

Szu Huat Goh, Y. H. Chan, Zhao Lin, Jeffrey Lam

Integr., 2017

2016

Application of Fast Laser Deprocessing Techniques on large cross-sectional view area sample with FIB-SEM dual beam system.

Yuzhe Zhao, Q. J. Wang, Pik Kee Tan, Huei Hao Yap, Binghai Liu, H. Feng, Hao Tan, Ran He, Y. M. Huang, D. D. Wang, Lei Zhu, C. Q. Chen, Francis Rivai, Jeffrey Lam, Zhihong Mai

Microelectron. Reliab., 2016

Application of laser deprocessing technique in PFA on chemical over-etched on bond-pad issue.

Huei Hao Yap, Pik Kee Tan, Lei Zhu, H. Feng, Yuzhe Zhao, Ran He, Hao Tan, B. Liu, Y. M. Huang, D. D. Wang, Jeffrey Lam, Zhihong Mai

Microelectron. Reliab., 2016

Cross-sectional nanoprobing fault isolation technique on submicron devices.

Pik Kee Tan, Huei Hao Yap, Changqing Chen, Francis Rivai, Yuzhe Zhao, Lei Zhu, Hua Feng, Hao Tan, Ran He, D. D. Wang, Y. M. Huang, Yin Zhe Ma, Jeffrey Lam, Zhi Hong Mai

Microelectron. Reliab., 2016

Electrical analysis on implantation-related defect by nanoprobing methodology.

Changqing Chen, P. T. Ng, Ghinboon Ang, H. Tan, Francis Rivai, Y. Z. Ma, Huipeng Ng, Jeffrey Lam, Zhihong Mai

Microelectron. Reliab., 2016

2015

Top-down delayering to expose large inspection area on die side-edge with Platinum (Pt) deposition technique.

Huei Hao Yap, Pik Kee Tan, G. R. Low, M. K. Dawood, Hua Feng, Yuzhe Zhao, Ran He, Hao Tan, J. Zhu, Binghai Liu, Y. M. Huang, D. D. Wang, Jeffrey Lam, Zhihong Mai

Microelectron. Reliab., 2015