Hyewon Shim

According to our database1, Hyewon Shim authored at least 13 papers between 2018 and 2024.

Collaborative distances:
  • Dijkstra number2 of four.
  • Erdős number3 of four.

Timeline

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Bibliography

2024
Hot-Carrier-Degradation Characterization for Accurate End-of-Life Prediction with 3nm GAA Logic Technology Featuring Multi-Bridge-Channel FET.
Proceedings of the IEEE Symposium on VLSI Technology and Circuits 2024, 2024

A Systematic Study of HCI Improvement in FinFET with Source/Drain Implant and Geometry Modulation.
Proceedings of the IEEE International Reliability Physics Symposium, 2024

An Analysis of CDM-induced BTI-like Degradation using VF-TLP in Advanced FinFET Technology.
Proceedings of the IEEE International Reliability Physics Symposium, 2024

2023
Polarity Dependency of MOL-TDDB in FinFET.
Proceedings of the IEEE International Reliability Physics Symposium, 2023

Impact of Barrier Metal Thickness on SRAM Reliability.
Proceedings of the IEEE International Reliability Physics Symposium, 2023

Reliability Assessment of 3nm GAA Logic Technology Featuring Multi-Bridge-Channel FETs.
Proceedings of the IEEE International Reliability Physics Symposium, 2023

2022
Accelerator-Based Thermal-Neutron Beam by Compact and Low-Cost Moderator for Soft-Error Evaluation in Semiconductor Devices.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

Thermal-Neutron SER Mitigation by Cobalt-Contact in 7 nm Bulk-FinFET Technology.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

2021
Time Dependent Variability in Advanced FinFET Technology for End-of-Lifetime Reliability Prediction.
Proceedings of the IEEE International Reliability Physics Symposium, 2021

2020
Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology.
Proceedings of the 2020 IEEE International Reliability Physics Symposium, 2020

2019
Aging-Aware Design Verification Methods Under Real Product Operating Conditions.
Proceedings of the IEEE International Reliability Physics Symposium, 2019

2018
Investigation of BTI characteristics and its behavior on 10 nm SRAM with high-k/metal gate FinFET technology having multi-V<sub>T</sub> gate stack.
Microelectron. Reliab., 2018

Effects of Far-BEOL anneal on the WLR and product reliability characterization of FinFET process technology.
Proceedings of the IEEE International Reliability Physics Symposium, 2018


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