Huilong Zhu
According to our database1,
Huilong Zhu
authored at least 14 papers
between 2015 and 2023.
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Bibliography
2023
Microelectron. J., 2023
2022
Proceedings of the International Conference on Artificial Intelligence, 2022
2021
Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit.
Microelectron. J., 2021
Investigation of negative DIBL effect for ferroelectric-based FETs to improve MOSFETs and CMOS circuits.
Microelectron. J., 2021
2020
Substrate effect on radiation-induced charge trapping in buried oxide for partially-depleted SOI NMOSFET.
IEICE Electron. Express, 2020
The Investigation of Negative Capacitance Vertical Nanowire FETs Based on SPICE Model at Device-Circuit Level.
CoRR, 2020
Influence of an ALD TiN capping layer on the PBTI characteristics of n-FinFET with ALD HfO<sub>2</sub>/TiN-capping/TiAl gate stacks.
Sci. China Inf. Sci., 2020
2019
Radiation-enhanced channel length modulation induced by trapped charges in buried oxide layer.
IEICE Electron. Express, 2019
2018
IEICE Electron. Express, 2018
IEICE Electron. Express, 2018
IEICE Electron. Express, 2018
2017
Microelectron. J., 2017
2016
Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer.
Microelectron. Reliab., 2016
2015
Proceedings of the 2015 IEEE 11th International Conference on ASIC, 2015