Hongbo Zhang
Affiliations:- Facebook, Inc., Menlo Park, USA
- Synopsys, Inc., Mountain View, CA, USA (former)
- University of Illinois at Urbana Champaign, USA (PhD 2012)
According to our database1,
Hongbo Zhang
authored at least 29 papers
between 2009 and 2020.
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Bibliography
2020
On Coloring Rectangular and Diagonal Grid Graphs for Multipatterning and DSA Lithography.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2020
2018
On coloring rectangular and diagonal grid graphs for multiple patterning lithography.
Proceedings of the 23rd Asia and South Pacific Design Automation Conference, 2018
2016
Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout.
Proceedings of the 21st Asia and South Pacific Design Automation Conference, 2016
2015
Comput. Electr. Eng., 2015
Contact pitch and location prediction for Directed Self-Assembly template verification.
Proceedings of the 20th Asia and South Pacific Design Automation Conference, 2015
Proceedings of the 20th Asia and South Pacific Design Automation Conference, 2015
2014
Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2014
Proceedings of the 51st Annual Design Automation Conference 2014, 2014
2013
A Polynomial Time Exact Algorithm for Overlay-Resistant Self-Aligned Double Patterning (SADP) Layout Decomposition.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2013
Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2013
Constrained pattern assignment for standard cell based triple patterning lithography.
Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2013
Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library.
Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, 2013
Proceedings of the 18th Asia and South Pacific Design Automation Conference, 2013
2012
A Practical Low-Power Nonregular Interconnect Design With Manufacturing for Design Approach.
IEEE J. Emerg. Sel. Topics Circuits Syst., 2012
Impact of lithography retargeting process on low level interconnect in 20nm technology.
Proceedings of the International Workshop on System Level Interconnect Prediction, 2012
A polynomial time exact algorithm for self-aligned double patterning layout decomposition.
Proceedings of the International Symposium on Physical Design, 2012
Proceedings of the 2012 IEEE/ACM International Conference on Computer-Aided Design, 2012
Proceedings of the 2012 IEEE/ACM International Conference on Computer-Aided Design, 2012
Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology.
Proceedings of the 49th Annual Design Automation Conference 2012, 2012
Proceedings of the 17th Asia and South Pacific Design Automation Conference, 2012
Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design.
Proceedings of the 17th Asia and South Pacific Design Automation Conference, 2012
2011
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2011
Proceedings of the 12th International Symposium on Quality Electronic Design, 2011
Proceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design, 2011
Self-aligned double patterning decomposition for overlay minimization and hot spot detection.
Proceedings of the 48th Design Automation Conference, 2011
Mask cost reduction with circuit performance consideration for self-aligned double patterning.
Proceedings of the 16th Asia South Pacific Design Automation Conference, 2011
2010
Proceedings of the 15th Asia South Pacific Design Automation Conference, 2010
2009
Proceedings of the 2009 International Symposium on Physical Design, 2009