Gennadi Bersuker
According to our database1,
Gennadi Bersuker
authored at least 23 papers
between 2001 and 2023.
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Bibliography
2023
Proceedings of the IEEE International Reliability Physics Symposium, 2023
2022
Combining measurements and modeling/simulations analysis to assess carbon nanotube memory cell characteristics.
Proceedings of the IEEE International Reliability Physics Symposium, 2022
Experimental demonstration of sub-nanosecond switching in 2D hexagonal Boron Nitride resistive memory devices.
Proceedings of the Device Research Conference, 2022
2021
Proceedings of the IEEE International Reliability Physics Symposium, 2021
2020
Memory update characteristics of carbon nanotube memristors (NRAM<sup>®</sup>) under circuitry-relevant operation conditions.
Proceedings of the 2020 IEEE International Reliability Physics Symposium, 2020
2019
Proceedings of the IEEE International Reliability Physics Symposium, 2019
2015
Electrical Analysis of High Dielectric Constant Insulator and Metal Gate Metal Oxide Semiconductor Capacitors on Flexible Bulk Mono-Crystalline Silicon.
IEEE Trans. Reliab., 2015
Substrate and temperature influence on the trap density distribution in high-k III-V MOSFETs.
Proceedings of the IEEE International Reliability Physics Symposium, 2015
Proceedings of the IEEE International Reliability Physics Symposium, 2015
2014
Assessing device reliability through atomic-level modeling of material characteristics.
Proceedings of the 2014 IEEE International Conference on IC Design & Technology, 2014
2013
Proceedings of the 2013 International Symposium on VLSI Design, Automation, and Test, 2013
Proceedings of the European Solid-State Device Research Conference, 2013
2012
Nanoscale observations of resistive switching high and low conductivity states on TiN/HfO<sub>2</sub>/Pt structures.
Microelectron. Reliab., 2012
Proceedings of the IEEE International Conference on IC Design & Technology, 2012
Proceedings of the 2012 European Solid-State Device Research Conference, 2012
2009
Temperature dependent time-to-breakdown (T<sub>BD</sub>) of TiN/HfO<sub>2</sub> n-channel MOS devices in inversion.
Microelectron. Reliab., 2009
2008
A novel approach to characterization of progressive breakdown in high-k/metal gate stacks.
Microelectron. Reliab., 2008
2007
Microelectron. Reliab., 2007
2006
Microelectron. Reliab., 2006
2005
Probing stress effects in HfO<sub>2</sub> gate stacks with time dependent measurements.
Microelectron. Reliab., 2005
2004
Microelectron. Reliab., 2004
2001