G. Scarel

According to our database, G. Scarel authored at least 1 paper in 2007.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of five.

2007

Degradation kinetics of ultrathin HfO₂ layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM.

Andrei Zenkevich, Yu. Lebedinskii, G. Scarel, Marco Fanciulli, Andrey Baturin, N. Lubovin

Microelectron. Reliab., 2007