D. Pic
According to our database1,
D. Pic
authored at least 4 papers
between 2007 and 2008.
Collaborative distances:
Collaborative distances:
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Bibliography
2008
Dynamic stress method for accurate NVM oxide robustness evaluation for automotive applications.
Microelectron. Reliab., 2008
Assessment of temperature and voltage accelerating factors for 2.3-3.2 nm SiO<sub>2</sub> thin oxides stressed to hard breakdown.
Microelectron. Reliab., 2008
2007
A comprehensive study of stress induced leakage current using a floating gate structure for direct applications in EEPROM memories.
Microelectron. Reliab., 2007
Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions.
Microelectron. Reliab., 2007