C. F. Tsang
According to our database1,
C. F. Tsang
authored at least 4 papers
between 2003 and 2005.
Collaborative distances:
Collaborative distances:
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Bibliography
2005
A study of post-etch wet clean on electrical and reliability performance of Cu/low k interconnections.
Microelectron. Reliab., 2005
Process improvement of 0.13mum Cu/Low K (Black Diamond<sup>TM</sup>) dual damascene interconnection.
Microelectron. Reliab., 2005
2004
Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization.
Microelectron. J., 2004
2003
Study and improvement of electrical performance of 130 nm Cu/CVD low k SiOCH interconnect related to via etch process.
Microelectron. J., 2003