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2012
The impact of device width on the variability of post-irradiation leakage currents in 90 and 65 nm CMOS technologies.
[DOI]
Nadia Rezzak
,
Pierre Maillard
,
Ronald D. Schrimpf
,
Michael L. Alles
,
Daniel M. Fleetwood
,
Yanfeng Albert Li
Microelectron. Reliab., 2012