2007
High-K dielectric deposition in 3D architectures: The case of Ta<sub>2</sub>O<sub>5</sub> deposited with metal-organic precursor TBTDET.
[DOI]
L. Pinzelli
,
M. Gros-Jean
,
Y. Bréchet
,
F. Volpi
,
A. Bajolet
,
J.-C. Giraudin
Microelectron. Reliab., 2007