Andres J. Torres

According to our database1, Andres J. Torres authored at least 15 papers between 2011 and 2024.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

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Links

On csauthors.net:

Bibliography

2024
Knowledge Transfer. From Electronic Design Automation to Advanced Process Manufacturing.
Proceedings of the 67th IEEE International Midwest Symposium on Circuits and Systems, 2024

Challenges and Opportunities in Heterogenous Integration During Design and Process Co-Optimization.
Proceedings of the 67th IEEE International Midwest Symposium on Circuits and Systems, 2024

2020
The k-path coloring problem in graphs of bounded treewidth: An application in integrated circuit manufacturing.
Oper. Res. Lett., 2020

Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, integer programming formulations, and numerical experiments.
Eur. J. Oper. Res., 2020

2019
DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments.
CoRR, 2019

2017
Overview and development of EDA tools for integration of DSA into patterning solutions.
Proceedings of the 18th International Symposium on Quality Electronic Design, 2017

2016
Advanced multi-patterning and hybrid lithography techniques.
Proceedings of the 21st Asia and South Pacific Design Automation Conference, 2016

2014
Litho-Friendly Decomposition Method for Self-Aligned Triple Patterning.
IEEE Trans. Very Large Scale Integr. Syst., 2014

2013
Litho-Friendly Decomposition Method for Self-Aligned Double Patterning.
IEEE Trans. Very Large Scale Integr. Syst., 2013

A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial].
IEEE Des. Test, 2013

2012
ICCAD-2012 CAD contest in fuzzy pattern matching for physical verification and benchmark suite.
Proceedings of the 2012 IEEE/ACM International Conference on Computer-Aided Design, 2012

2011
High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2011

Self-aligned double patterning (SADP) layout decomposition.
Proceedings of the 12th International Symposium on Quality Electronic Design, 2011

Rapid layout pattern classification.
Proceedings of the 16th Asia South Pacific Design Automation Conference, 2011

High performance lithographic hotspot detection using hierarchically refined machine learning.
Proceedings of the 16th Asia South Pacific Design Automation Conference, 2011


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