A. Benoist
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Bibliography
2015
Extended TDDB power-law validation for high-voltage applications such as OTP memories in High-k CMOS 28nm FDSOI technology.
Proceedings of the IEEE International Reliability Physics Symposium, 2015
Benefit of Al2O3/HfO2 bilayer for BEOL RRAM integration through 16kb memory cut characterization.
Proceedings of the 45th European Solid State Device Research Conference, 2015